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Subject: Re: [Homebrew_PCBs] Re: Dry film- negative resist... First attempt failure

From: Adam Seychell <a_seychell@...>
Date: 2008-10-21

javaguy11111 wrote:

>
> If you are trying to dilute down NaOH(Drano) then it could be trickier
> since NaOH is what is used to strip the resist after etching.

It would almost be impossible to develop with NaOH because even tiny
amount will shoot pH too high.

All negative dry film I've come across have specified a developer of
9~10 g/L sodium carbonate, at 24~27 deg.C. For paint brush style manual
developing, I find 30 to 35 deg.C better temperature.