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Subject: Re: Dry film- negative resist... First attempt failure

From: "javaguy11111" <javaguy11111@...>
Date: 2008-10-21

> using transparency than vellum. So my next attempt will be using
> transparencies and to carefully measure the developer.

If you are using washing soda for the developer you should not have
any problems with losing exposed traces because it is too strong.

If you are trying to dilute down NaOH(Drano) then it could be trickier
since NaOH is what is used to strip the resist after etching.

As others have mentioned though, the problem is probably due to
underexposure.