Adam Seychell wrote:
> I've been experimenting with some UV LEDs for building an exposure unit.
> I'm using the negative dry film photoresist and discovered to my
> surprise that there is a limitation on minimum light intensity. If the
> intensity its too low then no amount of time will cause photo
> polymerisation of the resist.
> For example, one LED I tested at 15mA, 120mm distance did not cause any
> polymerisation in 40 minutes. The same LED at 30mm distance, 20mA, took
> only 30 second for polymerisation.
>
> I found if the light cannot expose the resist within about 2 or 3
> minutes then the photoresist do not seem to react at all. At boarder
> line UV intensity, it partly polymerises leaving behind a soft matted
> looking resist after development.
>
> This imposes a design constraint on anyone who wants to make a LED
> exposure unit must because it there will be a minimum density of LEDs
> needed in the array. So far I've only experimented with single LED
> exposures. I'll make a 9 x 9 array for testing.
Have you tried using the same higher current and just increasing the
distance? Maybe the wavelength is increased at lower current, which
would reduce the photon energy.