all i know about liquod resist is the following:
its from a friend in hugary. he makes lots of prototypes, 0,15mm standard with.
always sprays on resist himself.
i didn't ask him for permission of posting this part of email but i think he would grant.
>> start
I detail tested the photopositive RESISTS:
POSITIVE 20
(KONTAKT CHEMIE)
CRAMOLIN POSITIVE RESIST ART.-NO. 126
(Chemische Produkte GmbH)
TN 120
(WOLF)
The TN 120 is big covering, develope quality is best, but
the resist not antistatic during lacking, and long drying time
1 day (the upper resist layer dry with high speed and slowing
the lower layer dry), totally unsensitive on color temperature
The lack is unsensitive for temperature too.
The price is low.
The POSITIVE 20 not antistatic, but sensitive for development
process (thermicaly), The pice is higher.
The CRAMOLIN 126 sensitive for good exposition time
and color temperature.
I recomending POSITIVE 20 or TN 120
with 1 day dry (2 min on 60 C plus 24 hour 24C)
>> stop
(lack=laquer)
this are german companies (he is in hungary).
you may nor get in the u.s. but maybe it helps.
regards
stefan
> Whoops, that would be me. Not sure what I was thinking when I wrote
>that. What I meant to say was I would plot a negative of the pattern
>without traces. Back on topic, can anyone tell me what type of liquid
>photo-resist (available in the USA) they use which can give consistent,
>repeatable results? I've tried two types of liquid resist; one which
>was developed using a caustic solution, and one which was developed
>using a very aggressive solvent. Neither one worked very well and I had
>a terrible time getting consistent results. Also, are any of this
>liquid resists visible after exposure? That's what I really enjoy about
>the dry-film resist; the pattern is very clear after exposure and you
>can usually tell when you've under/over-exposed just by looking at it.
>
>Larry
>
>
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