derekhawkins wrote:
> I'm attempting to debunk the following two myths at the same time;
>
> 1. A collimated light source is needed for .005" to .01" rules when
> photoetching.
>
> 2. All vertical bubble etching system cause uneven etching. Board size
> is 6"X4" hung vertically as shown.
>
> http://www.pbase.com/eldata/6_6_rules
I've used a vertical bubble etcher for a few years and have no uneven etching
at all. These myths are in the same category such as "ferric chloride is slow",
"PRP doesn't work", etc.