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Subject: Re: [Homebrew_PCBs] developing Aqua-Mer PR photoresist film

From: David Griffith <dgriffi@...>
Date: 2005-11-19

On Sat, 19 Nov 2005, Russell Shaw wrote:

> David Griffith wrote:
> > I've acquired a roll of liquidated Aqua-Mer PR photoresist film that I
> > intend to cut up into smaller quantities for sale on Ebay (toot! toot!).
> > My question: what is the correct developer? I picked up a bottle from a
> > downtown shop that turned out to be a sodium hydroxide solution, which I'd
> > rather not mess with given that it's relatively unforgiving with
> > overdevelopment.
>
> Sodium hydroxide is stripper. Try 10g/L sodium carbonate at 25-30degC.

I remember sodium silicate being referenced as a developer. Is that only
for positive spray resist?

--
David Griffith
dgriffi@...