Dry film, photo resist - progress and question...
2008-10-25 by lcdpublishing
Hi guys, I got a chance to do some more experimenting with the dry film photo process. I did a "step" test doing various exposure times and found out that the UV lamp I bought for this purpose simply isn't powerful enough. I have a regular light bulb of the right color range and tried that with much better results - exposure time through transparncy of only 3 minutes. I have much more experimenting to do to get it better, but was able to make my first board all the way through the etching process. A couple of questions... 1) When I used to have a black and white dark room, I discovered that the developer would last a long time and could be reused over and over again. I realize the developer for negative resist film is much different than photographic developer, but suspect that the chemical will stay "active" and as such, I could be reusing it. Has anyone tried this? 2) While doing the exposure / developer tests, I realized very quickly just how tough this resist is. I was scrubbing with a scotch brite pad vigorously without removing the resist. This leads me to the next question. Should the resist be removed or can it be left on the copper? If you have to remove it, how do you do it? Thanks in advance! Chris