On 07/07/2013 12:31, Kerry Koppert wrote: > I am trying to produce a small PCB for a SMD pic16f628a-i/so using > chinese blue dry film photoresist. The exposure seems to work fine using > a bank of uv leds and the photoresist turns a nice darkish blue around > 30-45 secs of exposure. I am trying to develop using washing soda (I > forget the exact strength but I think it was 200g in litre of water). I > am having difficulty getting this process right. Either some of the > unexposed photoresist does not come off (particularly between close > tracks) or some of the exposed photoresist lifts if I leave it longer. > Anyone having experience with this process willing to comment on what I > may be missing. I don't think that washing soda (sodium carbonate) will work, you sodium hydroxide. That's what I use - 2 teaspooons per litre. Leon -- Leon Heller G1HSM
Message
Re: [Homebrew_PCBs] Developing dry film photoresist
2013-07-07 by Leon Heller
Attachments
- No local attachments were found for this message.