I am trying to produce a small PCB for a SMD pic16f628a-i/so using chinese blue dry film photoresist. The exposure seems to work fine using a bank of uv leds and the photoresist turns a nice darkish blue around 30-45 secs of exposure. I am trying to develop using washing soda (I forget the exact strength but I think it was 200g in litre of water). I am having difficulty getting this process right. Either some of the unexposed photoresist does not come off (particularly between close tracks) or some of the exposed photoresist lifts if I leave it longer. Anyone having experience with this process willing to comment on what I may be missing.
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Developing dry film photoresist
2013-07-07 by Kerry Koppert
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