On 16/03/2010 19:03, Philip Pemberton wrote: > Hi guys, > Just a quick note -- it appears the developing chemistry in the Seno > SN110 roll-on developer is too weak to successfully develop Fotoboard2 > (which is currently sold by Rapid as their "RVFM Photo-Etch PCB"). I've > just wasted two Eurocard blanks trying to figure out what was going on, > only to find that the boards developed FAR quicker in a higher-strength > metasilicate developer. > > Whatever the developer in the SN110 roll-on is, it isn't > metasilicate. It does work fine on the CIF photo boards (e.g. Farnell > P/N 126-7748; in fact, it's a really fast-working developer on those). I > haven't tried it on the Farnell-sourced boards I have (P/N 320-4959) > though I suspect the results will be similar. From what I can gather, > these are the MicroTrak boards that Mega sell -- light blue lightproof > sticker with a white paper label on top of that which covers almost the > whole 160x100 board. Country of origin is Germany, recommended developer > is CPD5 (320-4996). > > Also, the Farnell metasilicate developer (320-4996, made by Mega and > sold by them as CPD5) is FAR too strong at 1:1 strength for these > boards. The bottle says 1ltr developer to 4ltr water (1+4 mix, or 1/5th > dev to 4/5ths water). Mixing at this ratio caused the "stringy peeling" > effect noted in the Rapid datasheet; it seems half or a quarter of this > concentration may be more appropriate. > > Three and a half hours wasted... > > Does anyone know of any other "incompatibilities" like this? > I use sodium hydroxide solution to develop Fotoboard 2 (12 gm/litre). Leon -- Leon Heller G1HSM
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Re: [Homebrew_PCBs] Seno roll-on developer and Fotoboard2
2010-03-16 by Leon Heller
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