Hi guys, Just a quick note -- it appears the developing chemistry in the Seno SN110 roll-on developer is too weak to successfully develop Fotoboard2 (which is currently sold by Rapid as their "RVFM Photo-Etch PCB"). I've just wasted two Eurocard blanks trying to figure out what was going on, only to find that the boards developed FAR quicker in a higher-strength metasilicate developer. Whatever the developer in the SN110 roll-on is, it isn't metasilicate. It does work fine on the CIF photo boards (e.g. Farnell P/N 126-7748; in fact, it's a really fast-working developer on those). I haven't tried it on the Farnell-sourced boards I have (P/N 320-4959) though I suspect the results will be similar. From what I can gather, these are the MicroTrak boards that Mega sell -- light blue lightproof sticker with a white paper label on top of that which covers almost the whole 160x100 board. Country of origin is Germany, recommended developer is CPD5 (320-4996). Also, the Farnell metasilicate developer (320-4996, made by Mega and sold by them as CPD5) is FAR too strong at 1:1 strength for these boards. The bottle says 1ltr developer to 4ltr water (1+4 mix, or 1/5th dev to 4/5ths water). Mixing at this ratio caused the "stringy peeling" effect noted in the Rapid datasheet; it seems half or a quarter of this concentration may be more appropriate. Three and a half hours wasted... Does anyone know of any other "incompatibilities" like this? -- Phil. ygroups@... http://www.philpem.me.uk/
Message
Seno roll-on developer and Fotoboard2
2010-03-16 by Philip Pemberton
Attachments
- No local attachments were found for this message.