Thanks to all who answered questions earlier I finally have made some success with Negative photo resist method. After about a month of trial and errors I have two nicely etched boards. Points I changed were: Better UV light the recommended (ER-2000) Longer drying times after coating blank with the resist Shorter developing times. Better negative now using overhead type laser copy instead of oil brushed tracing paper. Now I just need to get some new developer since I have wasted so much of what I had and probably a little bake oven to dry the emulsion both after I coat and before I etch. The only problem I am having is that the resist comes very close to dissolving in the etchent before the rest of the board is etched away. Are there other etchents that may be more suitably matched to this resist or should I just concentrate on drying it very well before etching and after the developing. Using ferric chloride with etch times of about 8min warm in bubbles Again thanks so much to all who offered pointers and helped, this is a great list, and wonderful to know there are others out there working through similar issues. Finally I can make something again :) ED
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Datak negative Resist Success
2004-01-09 by ednspace
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