On 24/03/12 21:24, Philip Pemberton wrote: > On the 170-second side, step 2 became more prominent (but was only > partly visible). Step 1 was clear (aside from the "Stouffer T2115" text). > > Is this roughly what I should be aiming for? And the answer is.... no! I exposed a board at 170 seconds. It had a thin film of photoresist coating the entire board -- almost invisible, except when it was dunked in the etchant and the copper didn't change colour. No matter what I did, this film wouldn't go away. So I figured I was about half a stop low on the exposure: 170 * 1.414 = 240 (240-170) / 2 = 35 170 + 35 = 205 seconds. Exposing at 205sec produced a good image (the developer turned a VERY deep blue this time around -- something to watch out for, at least). The "clear" areas really are clear (down to copper), and the non-clear areas are covered with photoresist. Steps 2 and 3 have now merged (3 was just about visible, but washed off in the etchant; 4 is ~50% covered). So it seems the rules for Microtrak are quite simple: 1) If step 2 is visible, you're underexposing. 2) If you can see the outline of the step wedge, you're DEFINITELY underexposing. 3) If in doubt, add half a stop. You most likely won't overexpose the photoresist, but you will improve your safety margin. Lord only knows how this applies to negative photoresist. I'll have to order some from the previously mentioned Greed-bay sellers and try it. One of these days I'll figure out the secret to this... and maybe write a little shareware app to calculate exposure figures based on density values. -- Phil. ygroups@... http://www.philpem.me.uk/
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Re: [Homebrew_PCBs] Interpreting step-wedge results
2012-03-24 by Philip Pemberton
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