> using transparency than vellum. So my next attempt will be using > transparencies and to carefully measure the developer. If you are using washing soda for the developer you should not have any problems with losing exposed traces because it is too strong. If you are trying to dilute down NaOH(Drano) then it could be trickier since NaOH is what is used to strip the resist after etching. As others have mentioned though, the problem is probably due to underexposure.
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Re: Dry film- negative resist... First attempt failure
2008-10-21 by javaguy11111