Hi guys, I tried my first photo process board this weekend and the process failed completely. I am using the dry film, negative resist from MG chemicals. The failure was in the developing of the resist. While developing, all the resist washed off. It was developed as I could see the traces in the resist, but faintly. The developer solution was a best guess on dilution so this is probably my main failure point. I am wondering what actually holds the resist to the board though. Per the instructions, I am suppose to peel off the backing, apply resist to the board and then run it through a laminator twice. Is this what causes the dry film to stick to the board or is it the exposure process? I also suspect that using vellum for the artwork is not a good thing. Using some scraps, I noticed that exposure is much different using transparncy than vellum. So my next attempt will be using transparencies and to carefully measure the developer. Chris
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Dry film- negative resist... First attempt failure
2008-10-20 by lcdpublishing
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