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Re: photomask shortcuts

2008-06-16 by javaguy11111

> >
> > "Leon" <leon355@...> writes:
> >
> >> > * Developer/stripper chemistry - is more concentrated ok?  Not
optimal
> >> >  from a cost point of view, but I'm thinking of
time-between-discards
> >> >  and shelf life.
> >>
> >> What are you using? It's quite critical for NaOH.
> >
> > Whatever samples javaguy is selling - http://www.pcbhobbyist.com/
> >
> >> Should be used at room temperature.
> 
> He recommends sodium carbonate, which isn't generally used. I use
about 12 
> g/litre sodium hydroxide. Sodium metasilicate is popular, and has
much more 
> latitude than NaOH. NaOH has unlimited shelf life and can be reused.
A more 
> concentrated solution can be used for stripping resist.


Actually the datasheet for the resist recommends that you do not use
NaOH for developing. Instead Sodium or Potassium Carbonate is
recommended.

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