----- Original Message ----- From: "DJ Delorie" <dj@...> To: <Homebrew_PCBs@yahoogroups.com> Sent: Monday, June 16, 2008 3:50 AM Subject: [Homebrew_PCBs] photomask shortcuts > > I've tweaked my UV box to even out the intensity (somewhat, not 100% > perfect but good enough). I'm ready to actually use it now :-) I've > got some questions about steps in the photo process that would be nice > to skip or otherwise cheat on: > > * Developer/stripper chemistry - is more concentrated ok? Not optimal > from a cost point of view, but I'm thinking of time-between-discards > and shelf life. What are you using? It's quite critical for NaOH. > > * Developer/stripper temperature - I can use warm water to mix it, but > heating it up for use might be tricky. Will it work at room > temperature, Should be used at room temperature. > > * Laminating - hotter OK? My laminator doesn't have a heat setting, > and the hot air gun is too unpredictable, so do I err on the side of > "hotter" or is "just right" important? > > * baking - 212F for 5 min after developing. How important is this? > How critical? Hot air gun OK? What do you need to laminate and bake? > > * bubbling/agitating developer/stripper - how much of an effect is > this? With the containers I have I could "swish" the boards around, > but that's about it. Just rock the container. It should take under 30s for development. I use IPA and a piece of kitchen towel for removing the resist. Leon
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Re: [Homebrew_PCBs] photomask shortcuts
2008-06-16 by Leon
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