Adam Seychell wrote: > I've been experimenting with some UV LEDs for building an exposure unit. > I'm using the negative dry film photoresist and discovered to my > surprise that there is a limitation on minimum light intensity. If the > intensity its too low then no amount of time will cause photo > polymerisation of the resist. > For example, one LED I tested at 15mA, 120mm distance did not cause any > polymerisation in 40 minutes. The same LED at 30mm distance, 20mA, took > only 30 second for polymerisation. > > I found if the light cannot expose the resist within about 2 or 3 > minutes then the photoresist do not seem to react at all. At boarder > line UV intensity, it partly polymerises leaving behind a soft matted > looking resist after development. > > This imposes a design constraint on anyone who wants to make a LED > exposure unit must because it there will be a minimum density of LEDs > needed in the array. So far I've only experimented with single LED > exposures. I'll make a 9 x 9 array for testing. Have you tried using the same higher current and just increasing the distance? Maybe the wavelength is increased at lower current, which would reduce the photon energy.
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Re: [Homebrew_PCBs] UV LED + photoresist experiments
2008-02-28 by Russell Shaw
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