Snip > The first "problem" I suspect I will run into is getting enough > density on the transparency to make sure the "black" areas are dense > enough to block out the UV exposure lamp where needed. Has anyone > run into this issue and how do you deal with it? Chris, I use the Positive Photo method. In the begining I was using over head transparencies and was having trouble obtaining a dark enough photo mask, even to the point of using two copies laid on top of one another. I switched to Vellum or tracing paper. I use 20# 8.5" * 11" paper and run it through the laser printer. Don't use light weight paper, it will crinkle in the laser. This paper is extremly translucent to UV light. As an example, using a single F15T8BL at 3.5 inches the Over head transparency took 10 minutes, the Vellum took 8 minutes to expose. Also Vellum is very inexpensive. I'm able to run a trace between two pads on an IC chip using the vellum. Ron
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Re: Photo-resist etching questions....
2007-05-20 by pcb.easy
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