On Sat, 19 Nov 2005, Russell Shaw wrote: > David Griffith wrote: > > I've acquired a roll of liquidated Aqua-Mer PR photoresist film that I > > intend to cut up into smaller quantities for sale on Ebay (toot! toot!). > > My question: what is the correct developer? I picked up a bottle from a > > downtown shop that turned out to be a sodium hydroxide solution, which I'd > > rather not mess with given that it's relatively unforgiving with > > overdevelopment. > > Sodium hydroxide is stripper. Try 10g/L sodium carbonate at 25-30degC. I remember sodium silicate being referenced as a developer. Is that only for positive spray resist? -- David Griffith dgriffi@...
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Re: [Homebrew_PCBs] developing Aqua-Mer PR photoresist film
2005-11-18 by David Griffith