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Subject: Developing dry film photoresist

From: Kerry Koppert <kkoppert@...>
Date: 2013-07-07

I am trying to produce a small PCB for a SMD pic16f628a-i/so using
chinese blue dry film photoresist. The exposure seems to work fine using
a bank of uv leds and the photoresist turns a nice darkish blue around
30-45 secs of exposure. I am trying to develop using washing soda (I
forget the exact strength but I think it was 200g in litre of water). I
am having difficulty getting this process right. Either some of the
unexposed photoresist does not come off (particularly between close
tracks) or some of the exposed photoresist lifts if I leave it longer.
Anyone having experience with this process willing to comment on what I
may be missing.