Archive of the former Yahoo!Groups mailing list: Homebrew PCBs
Subject: Energy for developing
From: Slavko Kocjancic <eslavko@...>
Date: 2012-01-12
Hello...
Does someone know what energy is nedded to develop photoresist?
I thinking to make an atacchment to CNC to make something like
photoploter(imagesetter) to develop direct pcb not film. Ie some lamp
and lenses to make beam paralel and adjustable apprture (iris).
And when 'drawing' line the aperture is oppened to make trace of light
of just correct width.
Now I'm stuck as I can't find data of different photoresist. I know that
near all of them need UV light of aprox 400nm wavelenght.
I know that few people try similar with laser. But near all fail in
presision. With laser the photoresist make buble as in developing
process the nitrogen gas is released from photoresist. So we need lower
energy.
So does someone have data for photoresists? And maybe some idea how to
realise optics?
Thanks
Slavko