Hi guys,
Just a quick note -- it appears the developing chemistry in the Seno
SN110 roll-on developer is too weak to successfully develop Fotoboard2
(which is currently sold by Rapid as their "RVFM Photo-Etch PCB"). I've
just wasted two Eurocard blanks trying to figure out what was going on,
only to find that the boards developed FAR quicker in a higher-strength
metasilicate developer.
Whatever the developer in the SN110 roll-on is, it isn't
metasilicate. It does work fine on the CIF photo boards (e.g. Farnell
P/N 126-7748; in fact, it's a really fast-working developer on those). I
haven't tried it on the Farnell-sourced boards I have (P/N 320-4959)
though I suspect the results will be similar. From what I can gather,
these are the MicroTrak boards that Mega sell -- light blue lightproof
sticker with a white paper label on top of that which covers almost the
whole 160x100 board. Country of origin is Germany, recommended developer
is CPD5 (320-4996).
Also, the Farnell metasilicate developer (320-4996, made by Mega and
sold by them as CPD5) is FAR too strong at 1:1 strength for these
boards. The bottle says 1ltr developer to 4ltr water (1+4 mix, or 1/5th
dev to 4/5ths water). Mixing at this ratio caused the "stringy peeling"
effect noted in the Rapid datasheet; it seems half or a quarter of this
concentration may be more appropriate.
Three and a half hours wasted...
Does anyone know of any other "incompatibilities" like this?
--
Phil.
ygroups@...http://www.philpem.me.uk/