Steve can you please change
drake@... to no email? It bounces every
time for the last few days.
ST
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> ---------- Forwarded message ----------
> From: Stefan Trethan <stefan_trethan@...>
> To: Homebrew_PCBs@yahoogroups.com
> Date: Sun, 13 Sep 2009 12:35:06 +0200
> Subject: Re: [Homebrew_PCBs] Re: developing immersion tank
>
>
> But this is the step after developing, done with water, not developer.
>
> To me it seems the resist will turn into gunk in the developer even
> without much agitation, and that gunk is washed away in the next step?
>
> ST
>
> On Sun, Sep 13, 2009 at 11:50 AM, Adam Seychell <a_seychell@...<a_seychell%40yahoo.com.au>>
> wrote:
>
> >
> > All the data sheets I've read have only mentioned developing with spray.
> > In my experience the resist simply does not wash away with simple
> > immersion or bubble agitation.
> >
> > From the data sheet http://www.dryfilmresist.com/pds/kg5100.pdf
> >
> > "To affectively clean between circuit traces to remove all developing
> > residue, the panels must be throughly rinsed
> > with water at temperatures ranging from 15 to 30℃ (59-86F) and pressures
> > greater than 1.4 bar(20psi). Poor
> > rinsing may promote ragged edges, rough plating, step plating, resist
> > lifting. Rinsing is a most important part of
> > the developing process."
> >
> > Adam
> >
>
>
>
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