I'm wondering if developing photoresist in an immersion tank would be a
good idea. Unexposed resist must be washed away with help from a moving
brush or sponge. All professional developing machines use spray. I found
the resist behaves a bit like clay stuck to the surface and it doesn't
dissolve away when just rocking the PCB in developer solution.
I was wondering if anyone has tried sticking a two pieces of sponge or a
pile fabric (see link) to the inside walls of a vertical tank. When the
PCB is immersed and moved around, it rubs on the fabric.
http://www.jongstit.com/product.php?product=Pile&Type=High%20Pile