"Don" <
don.froese@...> writes:
> I am trying to use MG chemicals dry film as a photo resist for
> etching metal parts but so far I have had difficulty with the
> emulsion not adhering well to the metal and leaving lots of holes in
> the mask. I am doing precision fine-line work (50 micron lines). I
> can not use a laminator to cure the film so I have been using a
> clothes iron with poor results. any recommendations for curing the
> film?
Try wet lamination:
http://members.optusnet.com.au/~eseychell/PCB/photoresist/Wet_Lamination_of_Photoresist_for_Hobbyists.pdfAlso, a heat gun is probably better than an iron for curing those
films.
> Also, is it possible to remove the upper (outer) protective plastic
> layer before exposing?
Possible? Sure. Good idea? No. The film traps gasses that are
generated by the polymerization process, and needs to stay in place
during exposure and for at least 15 minutes afterwards for best
results.