Archive of the former Yahoo!Groups mailing list: Homebrew PCBs

previous by date index next by date
previous in topic topic list next in topic

Subject: Re: UV LED + photoresist experiments

From: "javaguy11111" <javaguy11111@...>
Date: 2008-02-28

--- In Homebrew_PCBs@yahoogroups.com, Adam Seychell <a_seychell@...>
wrote:
>
> I've been experimenting with some UV LEDs for building an exposure
unit.
> I'm using the negative dry film photoresist and discovered to my
> surprise that there is a limitation on minimum light intensity. If the
> intensity its too low then no amount of time will cause photo
> polymerisation of the resist.
> For example, one LED I tested at 15mA, 120mm distance did not cause any
> polymerisation in 40 minutes. The same LED at 30mm distance, 20mA, took
> only 30 second for polymerisation.
>
> I found if the light cannot expose the resist within about 2 or 3
> minutes then the photoresist do not seem to react at all. At boarder
> line UV intensity, it partly polymerises leaving behind a soft matted
> looking resist after development.
>
> This imposes a design constraint on anyone who wants to make a LED
> exposure unit must because it there will be a minimum density of LEDs
> needed in the array. So far I've only experimented with single LED
> exposures. I'll make a 9 x 9 array for testing.
>

Definitely very peculiar. I would expect the exposure time to go up
with the square of the distance. So a four times increase in distance
would result in a 16 times exposure time. In your case it should have
taken 8 minutes.

Do you have any kind of material that fluouresces when you shine the
LEDs to see if there is uniform emission. I wonder if the UV could be
getting emitted in a ring pattern. If that were the case, when you get
too far away, the UV would not be hitting the resist.


I bought the Best HongKong LEDs as well. I received a notice from the
post office that I have to pick them up. When I get them I will try
the same kind of experiment to see what happens.