[sdiy] Can google's free* 180nm OSHW foundry be used for synth parts?
usenet at teply.info
usenet at teply.info
Sun Aug 7 12:46:17 CEST 2022
On 07.08.22 08:34, cheater cheater wrote:
> So on a 180 nm node, how many transistors and other primitives can be
> fit on 1 mm^2? How does that compare to a simple full synth voice, say
> something like a Minimoog?
>
Well, that depends. For analog applications, size of transistors and
therefore chip size doesn't really scale with technology node the way it
does for digital. Especially if one wants to minimize variations between
transistors - which is nearly always the case in analog applications -
transistors will be MUCH bigger than what the technology node suggests
as feature size. For analog applications, I'd expect to see transistor
lengths of 0.5 micron (500 nm) at least, in sensitive spots like current
mirrors even 1 micron or more. Transistor width scales with current
drive needed. For typical use, I'd guess something between 10 and 30
micron, so we end up with something like 1 by 40 microns per transistor
pair (nmos+pmos) including contacts. Passives will be significantly
bigger if we want to get values we typically see in schematics with not
too shabby variation between nominally identical devices. Take
capacitors for example. In CMOS processes targeted at analog and
mixed-signal applications, there very often is a dedicated MIM capacitor
available in addition to the parasitic MOS capacitor (Gate - gate oxide
- body). This specific process has comparably thick gate oxide for a
logic process, it seems to be intended for 3.3V and 5V peration. MOS
capacitance is spec'ed at 2.3 and 4.4 fF/µm² (yes, FemtoFarads per
square micron), so 1 pF will take 300 µm², 1 mm² will get you no more
than 3 nF effectively, and that will be nonlinear with respect to
applied voltage, and it will be frequency-dependent. MIM capacitance is
spec'ed at 1, 1.5 and 2 fF/µm², but linear.
Resistors will be similar: they are just by-products of transistor
formation, and they will be made of doped gate silicon. They are spec'ed
at 1kOhms, 2kOhms and 3kOhms per square, which indicate the process is
more targeted at low power applications than high speed. Naively, one
could state that the average 10k resistor could be made as small as half
a square micron (180nm line width, 3kR/sq resistor), but they will vary
a LOT: +/- 10% can easily be imagined without any detrimental effects
like self heating or tempco taken into account, and matching between
individual resistors on the same chip will be poor. Where accuracy and
stability are of concern, one wouldn't use the highest available sheet
resistance, which commonly is achieved by implanting both n- and p-type
dopands so they partly compensate, and would use widths significantly
wider than minimum. At 2kOhms/sq and 3 µm width, the mentioned 10k
resistor would take up a total of about 50 µm² with reasonable matching
between resistors. Absolute accuracy will still not be much better than
before.
The main problem however will be to decide, whether or not it actually
makes sense. I had a quick look at the schematic of the Oscillator board
of the minimoog. Let's do a quick back-of-the-evelope calculation:
Assuming we could get away with replacing every opamp with just three
differential pairs (two gain stages, one pair as current mirror), and
also could get away with replacing every bipolar transistor in the
schematic with a MOS, or the vertical PNP included in the process would
suit our needs, and we could simply replace the JFETs with MOSFETS, then
we would end up with roughly 100 to 120 differential pairs at 40 µm²
each. 100% overhead for wiring would give a nice round 10000µm² (=0.01
mm²) for the transistors alone. This is about the same size we would
need to take into account for one single bondpad (including spacing to
the next pad and keepout areas). The oscillator board has about 30
connections to the external world, most of which can not be done away
with at this level. From what I wrote above, it is clear that we cannot
integrate the capacitances as-is on chip, there's simply no way to get
100pF. But, we don't need to integrate all of it: Power supply
decoupling capacitors will be mostly off-chip in any case. For filter
capacitors it depends: we can either put them off chip and leave the
circuit as it is, then we'd need extra bondpads, further increasing chip
size. Or we adapt the circuit to achieve the same frequency response
with higher resistance and lower capacitance. After all, we hardly need
to take bias currents of stages further down the signal chain into
account as MOS transistor gates essentially draw none.
So, with, say 32 external connections in a square chip we'll get to a
minimum size of 1 mm², leaving about 0.5 mm² for active circuitry and
internal wiring. As we estimated transistor area for the oscillator at
0.01 mm², it seems manageable to integrate most of the oscillator board
into one single 1mm² chip, assuming we can get away with the
modifications outlined above. There should even be some room left for
some further refinements of the circuitry or cases where substituting a
full opamp with just three differential pairs wouldn't cut it. The
critical part however will be the passives.
With BGA packaging, even a small 0.4mm pitch will ask for 5 mm² unless
some interposer packaging is employed.
Bests,
Florian
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